Ness Ziona, Israel

Ben-Zion Ashtamker

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ben-Zion Ashtamker. Retrieved from https://idiyas.com/inventor/ben-zion-ashtamker

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ben-Zion Ashtamker

Introduction

Ben-Zion Ashtamker is a notable inventor based in Ness Ziona, Israel. He has made significant contributions to the field of printing technology. His innovative work has led to the development of a unique apparatus for applying liquids to printing surfaces.

Latest Patents

Ashtamker holds a patent for an "Apparatus and method for applying a liquid to a printing surface." This invention includes a housing designed to receive liquid, featuring an aperture that allows the liquid to flow out. The apparatus incorporates a liquid guide member that extends through the aperture, facilitating the transfer of liquid onto the printing surface. This design ensures efficient application as the printing surface moves relative to the apparatus.

Career Highlights

Ben-Zion Ashtamker is currently associated with Hewlett-Packard Development Company, L.P. His work at this esteemed company has allowed him to further his research and development in printing technologies. His innovative approach has contributed to advancements in the industry.

Collaborations

Ashtamker has collaborated with Alex Feygelman, enhancing the scope of his projects and contributing to the success of their joint efforts.

Conclusion

Ben-Zion Ashtamker's contributions to printing technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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