Barneveld, Netherlands

Ben Henken

This inventor holds 1 USPTO granted patent. Top assignee: Orlaco Products B.v.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ben Henken. Retrieved from https://idiyas.com/inventor/ben-henken

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Ben Henken

Introduction

Ben Henken is a notable inventor based in Barneveld, Netherlands. He has made significant contributions to the field of technology, particularly with his innovative designs. His work reflects a commitment to enhancing functionality and usability in everyday devices.

Latest Patents

Ben Henken holds a patent for a camera mounting arm. This invention showcases his ability to blend practicality with advanced engineering. The camera mounting arm is designed to provide stability and versatility for various camera setups, making it a valuable tool for photographers and videographers alike. He has 1 patent to his name.

Career Highlights

Ben Henken is currently employed at Orlaco Products B.V., a company known for its innovative solutions in the field of camera technology. His role at Orlaco allows him to further develop his ideas and contribute to cutting-edge projects. His dedication to his craft has positioned him as a respected figure in his industry.

Collaborations

Ben has collaborated with Alfred Van Den Brink, a fellow innovator at Orlaco Products B.V. Their partnership has led to the development of various projects that enhance the company's product offerings.

Conclusion

Ben Henken's journey as an inventor is marked by his innovative spirit and dedication to improving technology. His contributions, particularly in camera technology, continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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