Company Filing History:
Years Active: 2012
Title: The Innovative Contributions of Ben Golan
Introduction
Ben Golan is a notable inventor based in Kiryat Ono, Israel. He has made significant strides in the field of nanotechnology, particularly through his innovative methods for fabricating nano-scale patterned surfaces. His work has implications for various applications, including photocathodes and super-hydrophobic materials.
Latest Patents
Ben Golan holds a patent for a method of fabricating nano-scale patterned surfaces. This method involves patterning a substrate's surface to create an array of spaced-apart regions of a light-sensitive material. The process includes applying a controllable etching to the patterned surface for a predetermined duration, which forms a pattern with nano-scale features. After etching, the light-sensitive material is removed, resulting in a structure with nano-scale surface roughness. This roughness can be silanized with hydrophobic molecules to create super-hydrophobic properties, characterized by a large contact angle and a large tilting angle. Additionally, depositing a photo-active material on this nano-scale roughness enhances the photoemission yield of the photocathode, making it insensitive to the polarization of incident light.
Career Highlights
Ben Golan is associated with Yeda Research and Development Company Ltd., where he continues to explore and develop his innovative ideas. His work has contributed to advancements in nanotechnology and materials science, showcasing his expertise and commitment to research.
Collaborations
Throughout his career, Ben has collaborated with esteemed colleagues such as Ron Naaman and Zeev Fradkin. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ben Golan's contributions to the field of nanotechnology through his patented methods for fabricating nano-scale patterned surfaces highlight his role as a leading inventor. His work not only advances scientific understanding but also opens new avenues for practical applications in technology.