The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Sep. 12, 2010
Ron Naaman, Yarkona, IL;
Ben Golan, Kiryat Ono, IL;
Zeev Fradkin, Kiryat Malachi, IL;
Adam Winkleman, Brookline, MA (US);
Dan Oron, Rehovot, IL;
Ron Naaman, Yarkona, IL;
Ben Golan, Kiryat Ono, IL;
Zeev Fradkin, Kiryat Malachi, IL;
Adam Winkleman, Brookline, MA (US);
Dan Oron, Rehovot, IL;
Yeda Research and Development Company Ltd, Rehovot, IL;
Abstract
A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super-hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.