Ben Curtis

Title: Ben Curtis - Innovator in Plasma Etching Technology

Introduction

Ben Curtis is a notable inventor based in Plons, Switzerland. He has made significant contributions to the field of plasma etching technology. His innovative work has led to the development of a unique plasma etch chamber that enhances the efficiency of etching processes.

Latest Patents

Ben Curtis holds a patent for a "Plasma etch chamber and method of plasma etching." This invention includes a vacuum recipient with an etching compartment and a pumping compartment. The design features a metal partition wall that separates the two compartments, along with a workpiece support and an Rf feed line connected to the workpiece support. This innovative chamber is designed to improve the precision and effectiveness of plasma etching.

Career Highlights

Ben Curtis is currently employed at Evatec AG, a company known for its advanced technology solutions in the field of semiconductor manufacturing. His role at Evatec AG allows him to further develop and refine his inventions, contributing to the company's reputation for innovation.

Collaborations

Ben collaborates with Mohamed Elghazzali, working together to push the boundaries of plasma etching technology. Their partnership exemplifies the importance of teamwork in the field of innovation.

Conclusion

Ben Curtis is a distinguished inventor whose work in plasma etching technology has made a significant impact in the industry. His patent and ongoing contributions at Evatec AG highlight his commitment to advancing technological solutions.