Singapore, Singapore

Beichao Zhang


Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2003-2010

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: Beichao Zhang: Innovator in Semiconductor Technology

Introduction

Beichao Zhang is a prominent inventor based in Singapore, known for his contributions to semiconductor technology. He holds a total of 6 patents that showcase his innovative approaches in the field. His work has significantly impacted the development of advanced manufacturing processes in the semiconductor industry.

Latest Patents

Among his latest patents, Beichao Zhang has developed methods to eliminate contact plug sidewall slit. This method involves forming a barrier layer and contact plug using a touch-up reactive ion etching (RIE) process. In one embodiment, a first barrier layer made of tantalum (Ta) is formed over the dielectric layer and substrate in the contact hole. A second barrier layer, comprised of tantalum nitride (TaN) or tungsten nitride (WN), is then applied over the first barrier layer. The process includes planarizing a first conductive layer to create a contact plug in the contact hole, followed by reactive ion etching the top surfaces using a chlorine and boron-containing etch. The unique composition of the barrier layers and the RIE etch chemistry ensures that the barrier layers are not significantly etched selectively to the dielectric layer. Another notable patent involves a process to form a damascene opening without hardmask overhang or dielectric layer undercut. This innovative approach utilizes low-k dielectric material sandwiched between two hardmask films to create the dielectric film through which an interconnect opening is etched.

Career Highlights

Beichao Zhang is currently employed at Chartered Semiconductor Manufacturing Ltd, where he continues to advance semiconductor manufacturing techniques. His expertise in the field has led to significant advancements in the efficiency and effectiveness of semiconductor processes.

Collaborations

Throughout his career, Beichao has collaborated with notable colleagues, including Wuping Liu and Liang-Choo Hsia. These collaborations have fostered a productive environment for innovation and development in semiconductor technology.

Conclusion

Beichao Zhang's contributions to semiconductor technology through his patents and career at Chartered Semiconductor Manufacturing Ltd highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor manufacturing processes.

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