Suzhou, China

Bei Lei

This inventor holds 1 USPTO granted patent. Top assignee: Nuovo Film Suzhou China Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bei Lei. Retrieved from https://idiyas.com/inventor/bei-lei-whn28vse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Bei Lei in Touch Sensor Technology

Introduction

Bei Lei is a notable inventor based in Suzhou, China. He has made significant contributions to the field of touch sensor technology. His innovative approach has led to the development of a unique touch sensor that enhances user interaction with devices.

Latest Patents

One of Bei Lei's key patents is titled "Touch sensor and method for making the same." This invention provides a touch sensor that includes a substrate, an electrode layer located in a window area, and a frame trace located in a frame trace area. The frame trace consists of a plurality of metal wires, each of which includes a metal wire body that is electrically connected to a corresponding electrode in the electrode layer. An insulation layer wraps around the outer periphery of the metal wire body, allowing for a reduction in the width of the frame trace area.

Career Highlights

Bei Lei is currently employed at Nuovo Film Suzhou China Inc., where he continues to innovate in the field of touch sensor technology. His work has garnered attention for its practical applications and advancements in user interface design.

Collaborations

Bei Lei collaborates with talented individuals such as Biao Deng and Jie Ma. Their combined expertise contributes to the success of their projects and the advancement of technology in their field.

Conclusion

In summary, Bei Lei is a prominent inventor whose work in touch sensor technology has made a significant impact. His innovative patent and collaboration with skilled colleagues highlight his contributions to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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