Middland, PA, United States of America

Beatrice Schulte

This inventor holds 1 USPTO granted patent. Top assignee: Mcconway & Torley, LLC. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Beatrice Schulte. Retrieved from https://idiyas.com/inventor/beatrice-schulte

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Beatrice Schulte: Innovator in Coupler Technology

Introduction

Beatrice Schulte is a notable inventor based in Midland, PA (US). She has made significant contributions to the field of coupler technology, particularly with her innovative designs that enhance functionality and efficiency.

Latest Patents

Beatrice holds a patent for the Type E coupler yoke. This coupler yoke is constructed with a blunt nose, achieved by foreshortening the length of the nose. The nose length measures 3 inches, taken from a point at the forwardmost part of a semicircular end of the keyslot to the forwardmost end of the nose portion. The walls of the nose portion are solid and feature a trapezoidal cross-sectional shape. The nose wall extends rearwardly, merging with keyslot ribs on each side of the keyslot in the head portion of the yoke. This design improves the overall performance and reliability of the coupler.

Career Highlights

Beatrice Schulte is currently employed at McConway & Torley, LLC, where she continues to innovate and develop new technologies. Her work has been instrumental in advancing the company's product offerings and enhancing their reputation in the industry.

Collaborations

Beatrice collaborates with her coworker, William O. Elliott, to further enhance their projects and drive innovation within their team.

Conclusion

Beatrice Schulte is a pioneering inventor whose work in coupler technology has made a lasting impact. Her dedication to innovation and collaboration continues to inspire those in her field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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