Downers Grove, IL, United States of America

Beata Maria Oleksiewicz

This inventor holds 1 USPTO granted patent. Top assignee: Fluid Management Limited Partnership. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Beata Maria Oleksiewicz. Retrieved from https://idiyas.com/inventor/beata-maria-oleksiewicz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Beata Maria Oleksiewicz: Innovator in Dispensing Systems

Introduction

Beata Maria Oleksiewicz is a notable inventor based in Downers Grove, IL (US). She has made significant contributions to the field of dispensing systems, showcasing her innovative spirit and technical expertise.

Latest Patents

Oleksiewicz holds a patent for a versatile dispensing system. This system utilizes a nozzle assembly that includes a nozzle block defining a series of recesses for receiving dispense nozzles. A resilient clamp is inserted between the nozzles and compressed to expand, effectively clamping the nozzles in position. Additionally, a fill control mechanism is disclosed in her patent, enhancing the functionality of the dispensing system. She has 1 patent to her name.

Career Highlights

Beata is currently employed at Fluid Management Limited Partnership, where she continues to develop innovative solutions in her field. Her work has been instrumental in advancing dispensing technology, making processes more efficient and effective.

Collaborations

One of her notable coworkers is Michael J Rocheleau, with whom she collaborates on various projects within the company.

Conclusion

Beata Maria Oleksiewicz exemplifies the spirit of innovation through her work in dispensing systems. Her contributions are paving the way for advancements in this technology, and her patent reflects her commitment to improving industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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