Sunnyvale, CA, United States of America

Bean Huat Chua


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021-2025

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3 patents (USPTO):Explore Patents

Title: Innovations of Bean Huat Chua

Introduction

Bean Huat Chua is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of web content management systems. With a total of 3 patents to his name, Chua continues to push the boundaries of technology.

Latest Patents

One of his latest patents focuses on content source integration. In this embodiment, a web content management system is coupled to remote resources via a framework that has one or more corresponding adapters. These adapters enable editing of content by invoking editors that are native to the respective remote resources. The system retrieves a content item from a remote resource and stores a copy of the content item in a local repository, while the original content item remains in the repository of the remote resource. A content item can be selected in a local authoring tool, causing the system to examine the content item's metadata to identify the source repository and invoke the native editor of the corresponding remote resource. This allows for editing of the content item using the native editor. The copy of the content item in the local repository can then be synchronized to the edited version of the content item in the remote resource.

Career Highlights

Chua is currently employed at Open Text Holdings, Inc., where he applies his expertise in developing innovative solutions. His work has been instrumental in enhancing the functionality of web content management systems.

Collaborations

Some of his notable coworkers include Rakesh Kumar, Bipinchandra Shah, and Paul Kieron Carl Narth. Their collaborative efforts contribute to the advancement of technology in their field.

Conclusion

Bean Huat Chua is a notable inventor whose work in web content management systems has led to significant innovations. His contributions continue to shape the future of technology in this area.

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