Beleymas, France

Bastien Chautar

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Eurenco. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bastien Chautar. Retrieved from https://idiyas.com/inventor/bastien-chautar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovations of Bastien Chautar

Introduction

Bastien Chautar is an inventive mind hailing from Beleymas, France. He has made significant contributions to the field of technology, particularly with his innovative patent that focuses on enhancing the efficiency of paste pattern deposition.

Latest Patents

Chautar holds a patent for a "Device for laying paste patterns in a tube." This device is designed to deposit paste patterns on the surface of a tube's channel. It features a frame that supports a first mechanical assembly for holding, positioning, and moving the tube, along with a second mechanical assembly for extruding paste. These assemblies work in cooperation to achieve precise paste pattern deposition. He has 1 patent to his name.

Career Highlights

Bastien Chautar is currently employed at Eurenco, a company known for its expertise in energetic materials and related technologies. His role involves leveraging his innovative skills to develop advanced solutions in the field.

Collaborations

Chautar collaborates with talented individuals such as Julien Loyer and Sébastien Cuvelier, contributing to a dynamic work environment that fosters creativity and innovation.

Conclusion

Bastien Chautar's contributions to the field of technology through his innovative patent and collaborative efforts at Eurenco highlight his role as a significant inventor. His work continues to pave the way for advancements in paste pattern deposition technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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