Company Filing History:
1 out of 1 
1 out of 20 Years Active: 2000-2005
Title: Bastian Niemann: Innovator in Semiconductor Technology
Introduction
Bastian Niemann is a notable inventor based in Goettingen, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to examining structures on semiconductor substrates.
Latest Patents
One of his latest patents is a method for examining structures on a semiconductor substrate. This invention utilizes X-radiation in an X-ray microscope to image the structures. The wavelength of the X-radiation is adjusted based on the thickness of the semiconductor substrate, ensuring both suitable transmission and high-contrast imaging. This advancement allows for continuous observation of structures with short exposure times and high resolution, even while they are operational. Another patent he holds is for a condenser-monochromator arrangement for X-radiation, further enhancing the capabilities of semiconductor examination.
Career Highlights
Throughout his career, Bastian Niemann has worked with prominent companies in the field, including Leica Microsystems Lithography GmbH. His work has significantly impacted the development of advanced imaging techniques in semiconductor technology.
Collaborations
Bastian has collaborated with notable professionals in his field, including Gerd Schneider and Dirk Hambach. Their combined expertise has contributed to the advancement of semiconductor examination methods.
Conclusion
Bastian Niemann's innovative work in semiconductor technology, particularly through his patented methods, highlights his role as a key figure in advancing imaging techniques. His contributions continue to influence the industry and pave the way for future developments.