Dresden, Germany

Bastian Haussdoerfer


Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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4 patents (USPTO):

Title: Innovations by Bastian Haussdoerfer: Pioneering Semiconductor Technologies

Introduction

Bastian Haussdoerfer is an accomplished inventor based in Dresden, Germany. With a total of four patents to his name, he has made significant contributions to the field of semiconductor manufacturing, enhancing the efficiency and effectiveness of circuit designs.

Latest Patents

Among his latest patents, one notable innovation is related to balancing asymmetric spacers. In semiconductor circuit manufacturing that involves PFETs and NFETs, a challenge often arises when there is a disparity in spacer thickness between the two types of transistors. To address this issue, Bastian's invention proposes a manufacturing flow that introduces a spacer-reducing etching process before salicidation. This process is carried out immediately after ion implantation for the NFETs’ source/drain regions, utilizing the same mask employed during the implantations. As a result, this innovation successfully thins the NFET spacer structures, mitigating the imbalance in thickness between NFETs and PFETs.

Another significant patent involves a method of forming a semiconductor device using an optical planarization layer. This method details the steps for manufacturing a semiconductor device by first preparing a substrate that contains both a first area and a second area, separated by an isolation region. It encompasses the formation of an oxide layer, followed by the application of an optical planarization layer (OPL). The innovation includes etching the OPL to reveal the underlying oxide layer over the gate electrode of a transistor, thereby streamlining the manufacturing process for a range of semiconductor applications.

Career Highlights

Bastian Haussdoerfer currently works at GlobalFoundries Inc., where he leverages his expertise to push the boundaries of semiconductor technologies. Throughout his career, he has remained focused on innovative solutions that address critical manufacturing challenges.

Collaborations

Collaboration is key in the world of innovation, and Bastian has worked alongside notable colleagues such as Ardechir Pakfar and Joachim Patzer. Together, they contribute to advancing semiconductor technology, emphasizing teamwork and shared knowledge in their research and development efforts.

Conclusion

Bastian Haussdoerfer stands out not only for his inventive spirit but also for his practical contributions to the semiconductor industry. His patents address critical issues in circuit design and manufacturing, solidifying his reputation as a leading inventor in this field. With ongoing innovations and collaborations, Bastian continues to influence the future of semiconductor technology, paving the way for more efficient and effective electronic devices.

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