Company Filing History:
Years Active: 2021
Title: Basavaraj Pattanshetty: Innovator in Thin Film Deposition Technology
Introduction
Basavaraj Pattanshetty is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of thin film deposition technology. His innovative work has led to the development of a unique patent that enhances the efficiency of chemical precursor delivery in processing chambers.
Latest Patents
Pattanshetty holds a patent for a "Direct Liquid Injection System for Thin Film Deposition." This apparatus is designed for the direct liquid injection (DLI) of chemical precursors into a processing chamber. The system includes a vaporizer assembly with an injection valve that receives a liquid reactant, vaporizes it, and delivers the vaporized liquid reactant. The injection valve features a valve body with an interior region, a gas inlet port, a liquid inlet port, and a vapor outlet port, all in fluid communication. The vaporizer assembly is equipped with a first inlet line connected to a liquid source and a second inlet line connected to a carrier gas source, with a heater positioned between the two ends.
Career Highlights
Basavaraj Pattanshetty is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has allowed him to further develop his expertise in thin film deposition technologies. He has been instrumental in advancing the capabilities of the systems used in this area.
Collaborations
Pattanshetty has collaborated with several talented individuals in his field, including Subramanya P Herle and Vicente M Lim. These collaborations have contributed to the innovative solutions and advancements in technology that he has been a part of.
Conclusion
Basavaraj Pattanshetty is a distinguished inventor whose work in thin film deposition technology has made a significant impact. His patent for a direct liquid injection system exemplifies his innovative spirit and dedication to advancing the field. His contributions continue to influence the industry and inspire future innovations.