Barbara Fröschle

Title: Barbara Fröschle: Innovator in Semiconductor Technology

Introduction

Barbara Fröschle is a prominent inventor based in Dornstadt, Germany. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approaches. Her work focuses on methods that enhance the production and quality of semiconductor surfaces.

Latest Patents

Fröschle's latest patents include a method of producing a semiconductor surface covered with fluorine. This novel process involves placing a semiconductor substrate in a reaction chamber, where the surface is wetted with water and/or alcohol. A fluorine-containing compound is then introduced, resulting in a cleaned semiconductor surface covered with fluorine. The amount of fluorine can be controlled by adjusting the proportion of water in the mixture used for wetting.

Another significant patent is for producing a titanium monophosphide layer. In this method, a carrier is placed in a reactor, and a TiN layer is deposited by supplying TiCl and NH. The TiN layer is then annealed while PH is supplied, forming the titanium monophosphide layer on the TiN layer.

Career Highlights

Barbara Fröschle has worked with notable organizations, including Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. and Infineon Technologies AG. Her experience in these companies has allowed her to develop and refine her innovative techniques in semiconductor production.

Collaborations

Throughout her career, Fröschle has collaborated with esteemed colleagues such as Roland Leutenecker and Peter Ramm. These partnerships have contributed to her success and the advancement of semiconductor technologies.

Conclusion

Barbara Fröschle is a trailblazer in semiconductor technology, with her patents reflecting her innovative spirit and technical expertise. Her contributions continue to influence the field and inspire future advancements in semiconductor production.