Seongnam, South Korea

Banik Rahul

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Soonhan Engineering, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Banik Rahul. Retrieved from https://idiyas.com/inventor/banik-rahul

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations by Banik Rahul in Linear Motion Technology

Introduction

Banik Rahul is an accomplished inventor based in Seongnam, South Korea. He has made significant contributions to the field of linear motion technology, particularly in the area of dynamic and thermal error compensation.

Latest Patents

Banik Rahul holds a patent for a "System for compensating dynamic and thermal deformity errors of linear motion single-plane gantry stage in real time." This innovative system includes a first two-dimensional position measuring unit for measuring the position of an X-axially movable gantry beam, a second two-dimensional position measuring unit for a Y-axially movable slider, a thermal fixing point for thermal reference, and a compensation control unit for real-time error motion control.

Career Highlights

Banik Rahul is currently employed at Soonhan Engineering, Inc., where he applies his expertise in developing advanced motion control systems. His work focuses on enhancing the precision and reliability of linear motion applications.

Collaborations

Banik has collaborated with notable colleagues, including Byoung Gwan Ko and Jong Kyu Seo, to further advance their projects in the field of engineering.

Conclusion

Banik Rahul's innovative work in linear motion technology exemplifies the importance of addressing dynamic and thermal errors in engineering applications. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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