Phoenix, AZ, United States of America

Balu Pathangey

This inventor holds 1 USPTO granted patent. Top assignee: Oregon Health & Science University. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Balu Pathangey. Retrieved from https://idiyas.com/inventor/balu-pathangey-j7mia2p4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2007

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Balu Pathangey: Innovator in Metallic Film Etching

Introduction

Balu Pathangey is a notable inventor based in Phoenix, AZ (US). He has made significant contributions to the field of materials science, particularly in the area of etching metallic films on substrates. His innovative methods have the potential to enhance various applications in technology and manufacturing.

Latest Patents

Balu Pathangey holds 1 patent for a method of etching a metallic film on a substrate. This method operates by injecting an oxidizing agent through the use of a carrier gas to etch a source metal in the presence of a reducing agent. The rate of etching can be controlled by adjusting the flow rate of the carrier gas, the substrate temperature, the pulse widths of the oxidizing and reducing agents, and the number of etching phases.

Career Highlights

Balu Pathangey is affiliated with Oregon Health & Science University, where he applies his expertise in materials science. His work has contributed to advancements in the field, showcasing his commitment to innovation and research.

Collaborations

Balu collaborates with Rajendra Solanki, further enhancing the scope of his research and development efforts. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Balu Pathangey's contributions to the field of metallic film etching demonstrate his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…