Union City, CA, United States of America

Balaji Ganapathy


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Balaji Ganapathy: Innovator in Model-Based Critical Dimension Measurements

Introduction

Balaji Ganapathy is a notable inventor based in Union City, CA. He has made significant contributions to the field of critical dimension measurements through his innovative techniques and systems. His work is particularly relevant in the semiconductor industry, where precision is paramount.

Latest Patents

Balaji holds a patent for "Techniques and systems for model-based critical dimension measurements." This patent describes a method where a reticle is inspected using an imaging system to obtain a measured image of a structure on the reticle. The structure has an unknown critical dimension (CD). By utilizing a model, a calculated image is generated based on a design database that outlines the pattern used to form the structure. The model takes into account the optical properties of reticle materials, a computational model of the imaging system, and an adjustable CD. The process involves minimizing the norm of the difference between the measured and calculated images by adjusting the CD iteratively to determine the final CD for the unknown structure.

Career Highlights

Balaji is currently employed at Kla Tencor Corporation, where he applies his expertise in critical dimension measurements. His work has been instrumental in advancing measurement techniques that enhance the accuracy and reliability of semiconductor manufacturing processes.

Collaborations

Throughout his career, Balaji has collaborated with talented individuals such as Abdurrahman Sezginer and Eric Vella. These collaborations have fostered an environment of innovation and have contributed to the development of cutting-edge technologies in the field.

Conclusion

Balaji Ganapathy's contributions to model-based critical dimension measurements exemplify the importance of innovation in the semiconductor industry. His work not only enhances measurement accuracy but also supports the ongoing advancement of technology.

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