Chiryu, Japan

Baksa Chi

This inventor holds 2 USPTO granted patents. Top assignee: Fuji Machine Mfg. Co., Ltd.. Active years: 2006-2007.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2006-2007

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2 patents (USPTO):Explore Patents

Title: Innovations of Baksa Chi

Introduction

Baksa Chi is a notable inventor based in Chiryu, Japan. He has made significant contributions to the field of imaging technology, particularly in methods related to fiducial marks and electric components. With a total of 2 patents, his work showcases a blend of creativity and technical expertise.

Latest Patents

Chi's latest patents include a "Method and apparatus for searching for fiducial marks" and a "Method of detecting positions of the fiducial marks." The first patent involves processing image data indicative of images of the fiducial mark and its surrounding area. This method utilizes an imaging device and an image-data processing device to store reference lines corresponding to the fiducial mark's profile. The second patent focuses on detecting the position of a lead of an electric component, which includes illuminating a portion of the lead and taking an image to process the data for accurate detection.

Career Highlights

Baksa Chi is currently employed at Fuji Machine Mfg. Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of imaging systems used in various applications.

Collaborations

Chi has collaborated with notable coworkers such as Seigo Suzuki and Hirotake Esaki, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Baksa Chi's contributions to imaging technology through his patents reflect his dedication to advancing the field. His innovative methods for detecting fiducial marks and electric component leads demonstrate the impact of his work in practical applications.

Profile summary based on public USPTO records.
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