Newark, DE, United States of America

Baishen Liang

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Baishen Liang. Retrieved from https://idiyas.com/inventor/baishen-liang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Baishen Liang and His Patent in Fluorinated Ether Production.

Introduction

Baishen Liang is an inventor associated with Newark, Delaware, and E.I. du Pont de Nemours and Company. His patent describes a process for producing two fluorinated vinyl ethers from hexafluoropropylene epoxide and a mixture of carbonyl fluoride and perfluoroacetyl fluoride.

Latest Patents

Liang is credited with 1 patent, titled “Co-production of Perfluoromethyl Perfluorovinyl Ether and Perfluoroethyl Perfluorovinyl Ether.” The disclosed process first reacts hexafluoropropylene epoxide with the specified fluoride mixture to produce PMPF and PEPF. It then dehalocarbonylates those intermediates to produce perfluoromethyl perfluorovinyl ether (PMVE) and perfluoroethyl perfluorovinyl ether (PEVE).

Career Highlights

Liang’s listed patent work is connected with E.I. du Pont de Nemours and Company and focuses on the production of fluorinated chemical compounds. The patent outlines a two-step approach that co-produces PMVE and PEVE.

Collaborations

The provided information names Paul Raphael Resnick and Ming-Hong Hung as Liang’s coworkers. Their specific roles in the patent or related work are not stated.

Conclusion

Baishen Liang’s patent documents a process for co-producing PMVE and PEVE through the formation and subsequent conversion of fluorinated intermediates.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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