Badru D Hyatt

Title: Badru D Hyatt: Innovator in Wafer Measurement Technology

Introduction

Badru D Hyatt is a notable inventor based in San Jose, California. He has made significant contributions to the field of wafer measurement technology, particularly with his innovative approach that simplifies the measurement process.

Latest Patents

Hyatt holds a patent for a "Bathless Wafer Measurement Apparatus and Method." This invention provides a solution for measuring the film thickness property of a wafer without the need for a water bath or complex wafer handling apparatus. The apparatus features a chuck that supports the wafer and includes a metrology module for measuring film thickness properties. This design allows for efficient measurements while minimizing complications associated with traditional methods.

Career Highlights

Hyatt is associated with Sensys Instruments Corporation, where he applies his expertise in developing advanced measurement technologies. His work has been instrumental in enhancing the efficiency and accuracy of wafer measurements in various applications.

Collaborations

Hyatt has collaborated with notable colleagues, including Michael Weber-Grabau and Ivelin A Anguelov. These partnerships have contributed to the advancement of innovative solutions in the field.

Conclusion

Badru D Hyatt's contributions to wafer measurement technology exemplify his commitment to innovation and efficiency. His patent and work at Sensys Instruments Corporation highlight his role as a key figure in advancing measurement methodologies.