This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Molecular Imprints, Inc.. Active years: 2013-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013-2014
Title: Babak Mokaberi: Innovator in Nano-Lithography
Introduction
Babak Mokaberi is a notable inventor based in Cedar Park, TX (US). He has made significant contributions to the field of nano-lithography, holding 2 patents that showcase his innovative approach to technology.
Latest Patents
Mokaberi's latest patents include a method for misalignment management. This method determines overlay error between a template and a substrate by utilizing the placement of template features and substrate features in one or more images. The estimated distortion of the template and/or substrate can be assessed using the overlay error. Furthermore, one or more forces acting on the template and/or substrate may be adjusted based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance. Another significant patent is an optical system for use in stage control. This system enhances imprint lithography by ensuring precise alignment between a template and a substrate during the imprinting process. A moiré signal, resulting from indicia on both the template and substrate, is captured by a system that includes a line-scan camera and a digital micromirror device (DMD). This setup provides a high bandwidth, low-latency signal that can be used directly to align the template and substrate without the need for discrete position or angle encoders.
Career Highlights
Babak Mokaberi is currently employed at Molecular Imprints, Inc., where he continues to push the boundaries of technology in the field of nano-lithography. His work has been instrumental in advancing the capabilities of imprint lithography.
Collaborations
Mokaberi collaborates with Philip D Schumaker, contributing to innovative projects and research in their field.
Conclusion
Babak Mokaberi is a prominent figure in the realm of nano-lithography, with a focus on improving alignment and precision in imprinting processes. His patents reflect his commitment to innovation and excellence in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile