San Jose, CA, United States of America

B Michelle Chen

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: B Michelle Chen: Innovator in Copper Film Annealing

Introduction

B Michelle Chen is a notable inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor manufacturing, particularly in the annealing of copper films. His innovative approach has the potential to enhance the efficiency and effectiveness of integrated processing systems.

Latest Patents

B Michelle Chen holds a patent for a "Method and apparatus for annealing copper films." This invention involves a method that comprises forming a copper layer by electroplating on a substrate within an integrated processing system. The copper layer is then annealed in a chamber inside the same integrated processing system. This patent showcases his expertise in improving manufacturing processes in the semiconductor industry.

Career Highlights

Chen is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to focus on developing advanced technologies that drive innovation in semiconductor manufacturing. His contributions have been instrumental in enhancing the performance and reliability of electronic devices.

Collaborations

Throughout his career, B Michelle Chen has collaborated with talented professionals, including Ho Seon Shin and Yezdi N Dordi. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

B Michelle Chen is a distinguished inventor whose work in the annealing of copper films has made a significant impact on the semiconductor industry. His innovative methods and dedication to advancing technology continue to inspire future developments in the field.

Profile summary based on public USPTO records.
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