Matsumoto, Japan

Ayumu Nakamura

This inventor holds 11 USPTO granted patents and 2 published patent applications. Top assignee: Seiko Epson Corporation. Active years: 2013-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ayumu Nakamura. Retrieved from https://idiyas.com/inventor/ayumu-nakamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 9

Forward Citations = 196(Granted Patents)


Location History:

  • Matsumoto, JP (2013 - 2018)
  • Tokyo, JP (2020)

Company Filing History:


Years Active: 2013-2020

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11 patents (USPTO):Explore Patents

Title: Ayumu Nakamura: Innovator in Printing Technology

Introduction

Ayumu Nakamura is a prominent inventor based in Matsumoto, Japan. He has made significant contributions to the field of printing technology, holding a total of 11 patents. His work has been instrumental in advancing the capabilities and efficiency of printers.

Latest Patents

One of his latest innovations is a state-of-the-art printer that enhances printing quality and speed. This invention reflects his commitment to improving user experience and technological performance in the printing industry.

Career Highlights

Ayumu Nakamura is currently employed at Seiko Epson Corporation, a leading company in the printing and imaging sector. His role at the company allows him to leverage his expertise in developing cutting-edge printing solutions.

Collaborations

Throughout his career, Ayumu has collaborated with talented individuals such as Hiroto Miyauchi and Yoshiki Kinoshita. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Ayumu Nakamura's contributions to printing technology exemplify his dedication to innovation and excellence. His work continues to influence the industry and inspire future advancements in printing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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