Munich, Germany

Axel Niemoller

This inventor holds 1 USPTO granted patent. Top assignee: Sinhl Gmbh. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Axel Niemoller. Retrieved from https://idiyas.com/inventor/axel-niemoller

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Axel Niemoller

Introduction

Axel Niemoller is a notable inventor based in Munich, Germany. He has made significant contributions to the field of inkjet printing technology. His innovative work has led to the development of a unique recording material specifically designed for inkjet printing applications.

Latest Patents

Axel Niemoller holds a patent for a recording material for inkjet printing. This patent showcases his expertise and commitment to advancing printing technology. He has been recognized for his innovative approach in this area, which has the potential to enhance the quality and efficiency of inkjet printing.

Career Highlights

Axel Niemoller is currently employed at Sinhl GmbH, where he continues to work on innovative projects. His role at the company allows him to collaborate with other talented professionals in the field. His career is marked by a dedication to research and development in printing technologies.

Collaborations

Some of Axel's coworkers include Ralf Liebler and Manfred Schafer. Their collaboration fosters a creative environment that encourages innovation and the sharing of ideas. Together, they contribute to the advancement of technology within their industry.

Conclusion

Axel Niemoller's contributions to inkjet printing technology exemplify the spirit of innovation. His patent and work at Sinhl GmbH highlight his commitment to improving printing solutions. Through collaboration with his colleagues, he continues to push the boundaries of what is possible in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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