Dresden, Germany

Axel Henke


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):

Title: The Innovative Contributions of Axel Henke in Plasma Reactor Technology

Introduction

Axel Henke, an inventive mind based in Dresden, Germany, has made significant strides in the field of plasma reactor technology. With one notable patent to his name, he showcases the blend of creativity and engineering prowess necessary for modern technological advancement. This article delves into his latest patent, career highlights, and collaborations that underpin his contributions to the industry.

Latest Patents

Axel Henke holds a patent for a "Method for etching high-aspect-ratio features." This innovation involves an advanced technique for operating a plasma reactor, where high-aspect-ratio features are etched on a workpiece within a vacuum chamber. The patented method encompasses an etch process followed by a flash process. During the etch phase, a first gas is introduced into the vacuum chamber while maintaining a plasma composed of both etchant and passivant species. Subsequently, the flash process employs a second gas that facilitates the removal of deposits, ensuring precision and effectiveness in the etching process. This method enhances the functionality and quality of the final products manufactured using the reactor.

Career Highlights

Axel Henke has established himself in the technological arena through his tenure at Applied Materials, Inc. His role in the company has enabled him to innovate and implement cutting-edge solutions in the realm of semiconductor manufacturing. The experience and exposure he has garnered here are pivotal in shaping his inventive contributions.

Collaborations

In the course of his career, Axel has had the opportunity to collaborate with esteemed colleagues such as Ajay Kumar and Anisul Haque Khan. These partnerships have fostered an environment of creativity and innovation, culminating in advancements that push the boundaries of current technology.

Conclusion

Axel Henke's contributions, particularly his patented method for etching high-aspect-ratio features, illustrate the vital role inventors play in the advancement of technology. His collaboration with notable professionals and his position at Applied Materials, Inc. stand as a testament to the innovative spirit within the field. As technology continues to evolve, the impact of such inventors will be pivotal in shaping the future.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…