Beijing, China

Awei Sui

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Awei Sui. Retrieved from https://idiyas.com/inventor/awei-sui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Awei Sui: Innovator in Chamber Sealing Mechanisms

Introduction

Awei Sui is a notable inventor based in Beijing, China. He has made significant contributions to the field of engineering, particularly with his innovative designs and mechanisms. His work focuses on enhancing the efficiency and functionality of various systems.

Latest Patents

Awei Sui holds a patent for a chamber sealing mechanism and pressurization bubble-eliminating equipment. This invention includes an annular groove and a sealing ring, which together form a closed cavity. The design features a gas charging valve that allows for the charging and discharging of air from the closed cavity, thereby improving the overall performance of the system. He has 1 patent to his name.

Career Highlights

Throughout his career, Awei Sui has worked with prominent companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Hefei BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions.

Collaborations

Awei Sui has collaborated with several talented individuals in his field. Notable coworkers include Bo Zhang and Jinjun Wang, who have worked alongside him on various projects.

Conclusion

Awei Sui's contributions to the field of engineering, particularly through his patent for a chamber sealing mechanism, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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