Givat Haim, Israel

Avner Lam

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Alma Lasers Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Avner Lam. Retrieved from https://idiyas.com/inventor/avner-lam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Avner Lam: Innovator in CO2 Laser Application Systems

Introduction

Avner Lam is a notable inventor based in Givat Haim M., Israel. He has made significant contributions to the field of laser technology, particularly with his innovative CO2 laser application system. His work has garnered attention for its potential applications in various industries.

Latest Patents

Avner Lam holds one patent for his CO2 laser application system. This invention showcases his expertise and commitment to advancing laser technology. The patent reflects his innovative approach to solving complex problems in the field.

Career Highlights

Avner is currently employed at Alma Lasers Ltd., a company known for its cutting-edge laser solutions. His role at Alma Lasers Ltd. allows him to further develop his ideas and contribute to the company's mission of providing advanced laser technologies.

Collaborations

Avner collaborates with Tomer Touviano, a coworker who shares his passion for innovation in laser technology. Their partnership exemplifies the collaborative spirit that drives advancements in their field.

Conclusion

Avner Lam is a dedicated inventor whose work in CO2 laser application systems has the potential to impact various industries. His contributions at Alma Lasers Ltd. and collaboration with Tomer Touviano highlight his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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