Nes Ziona, Israel

Avner Karpol

This inventor holds 1 USPTO granted patent. Top assignee: Optrotech Ltd.. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Avner Karpol. Retrieved from https://idiyas.com/inventor/avner-karpol-35zg4odm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Avner Karpol: Innovator in Optical Scanning Technology

Introduction

Avner Karpol is a notable inventor based in Nes Ziona, Israel. He has made significant contributions to the field of optical scanning technology. His innovative approach has led to the development of a unique optical scanning apparatus.

Latest Patents

Avner Karpol holds a patent for an optical scanning apparatus. This invention comprises a base, a light source mounted on the base, and a camera arranged to observe a workpiece surface to be scanned. Additionally, it features an optical waveguide that directs light to the workpiece surface. The optical waveguide is designed to provide uniform, homogeneous diffuse illumination, effectively preventing the definition of shadows on the workpiece surface.

Career Highlights

Karpol is associated with Optrotech Ltd., a company that specializes in advanced optical technologies. His work at Optrotech has allowed him to focus on developing innovative solutions in the field of optical scanning.

Collaborations

Throughout his career, Avner has collaborated with notable colleagues, including Emmanuel B Nun and Rafi Izhar. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Avner Karpol's contributions to optical scanning technology exemplify his innovative spirit and dedication to advancing the field. His patent for the optical scanning apparatus showcases his ability to solve complex problems through inventive solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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