Bengaluru, India

Avinash Nayak

This inventor holds 3 USPTO granted patents and 4 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Avinash Nayak. Retrieved from https://idiyas.com/inventor/avinash-nayak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 9.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2026

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3 patents (USPTO):Explore Patents

Title: Avinash Nayak: Innovator in Physical Vapor Deposition Technology

Introduction

Avinash Nayak is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of physical vapor deposition technology. His innovative work has led to the development of a patent that enhances the efficiency of deposition processes.

Latest Patents

Avinash Nayak holds one patent titled "Target profile for a physical vapor deposition chamber target." This patent addresses critical aspects of target design, which are essential for improving the performance of deposition chambers.

Career Highlights

Avinash is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role involves research and development, where he applies his expertise to advance technology in physical vapor deposition.

Collaborations

Some of Avinash's coworkers include Shane Lavan and Madan Kumar Shimoga Mylarappa. Their collaborative efforts contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Avinash Nayak's contributions to physical vapor deposition technology exemplify the impact of innovation in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his role as a key inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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