Yishuv Adi, Israel

Aviad Roth

This inventor holds 1 USPTO granted patent. Top assignee: Tower Semiconductor Ltd.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aviad Roth. Retrieved from https://idiyas.com/inventor/aviad-roth

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Aviad Roth: Innovator in Integrated Circuit Technology

Introduction

Aviad Roth is a notable inventor based in Yishuv Adi, Israel. He has made significant contributions to the field of integrated circuit technology. His innovative approach has led to the development of a unique patent that enhances the manufacturing process of integrated circuits.

Latest Patents

Aviad Roth holds a patent for a "Method for depositing a flow fill layer on an integrated circuit wafer." This patent describes an improved method for depositing the cap layer of a flow fill layer on an integrated circuit. The innovative aspect of this method is that the cap layer is deposited in at least two steps, rather than all at once. This advancement can lead to better performance and reliability in integrated circuits.

Career Highlights

Aviad Roth is currently employed at Tower Semiconductor Ltd., a leading company in the semiconductor industry. His work at Tower Semiconductor has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of semiconductor technology.

Collaborations

Throughout his career, Aviad has collaborated with talented individuals such as Itzhak Edrei and Jeff Levy. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Aviad Roth is a distinguished inventor whose work in integrated circuit technology has made a significant impact. His patent for an improved method of depositing flow fill layers showcases his innovative spirit and dedication to advancing the field. His contributions continue to influence the semiconductor industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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