Netanya, Israel

Avi Rogalsky

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Avi Rogalsky: Innovator in Azimuth Accuracy Technology

Introduction

Avi Rogalsky is a notable inventor based in Netanya, Israel. He has made significant contributions to the field of technology, particularly in improving azimuth accuracy through innovative systems. His work focuses on enhancing the precision of Line Of Sight (LOS) measurements, which is crucial for various applications.

Latest Patents

Avi Rogalsky holds a patent for a system titled "Fixing magnetometer based azimuth according to sun positioning." This invention aims to improve the azimuth accuracy of a LOS by adjusting the azimuth value obtained from magnetometer-based inertial sensors according to the sun's position. The system comprises one or more magnetometer-based inertial sensors, imaging sensors, location sensors, and processors. The processors execute code instructions to obtain location, elevation, and time from the location sensors, as well as sensor-based azimuth values from the magnetometer sensors. By analyzing images captured by the imaging sensors, the system calculates the actual azimuth value concerning the sun's center and automatically adjusts the sensor-based azimuth value accordingly.

Career Highlights

Avi Rogalsky is currently associated with Ride On Corp. Inc., where he continues to develop and refine his innovative technologies. His expertise in sensor technology and image processing has positioned him as a valuable asset in his field.

Collaborations

Avi collaborates with talented individuals such as Alon Getz and Samuel Alexander Rabinovich. Their combined efforts contribute to the advancement of technology in their respective areas of expertise.

Conclusion

Avi Rogalsky's work in azimuth accuracy technology showcases his innovative spirit and dedication to improving measurement systems. His contributions are paving the way for advancements in various technological applications.

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