Saitama, Japan

Atsushi Ohki

This inventor holds 1 USPTO granted patent. Top assignee: Osaka Sanso Kogyo Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Ohki. Retrieved from https://idiyas.com/inventor/atsushi-ohki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Atsushi Ohki: Innovator in Leakage Measurement Technology

Introduction

Atsushi Ohki is a notable inventor based in Saitama-ken, Japan. He has made significant contributions to the field of measurement technology, particularly in the area of external leakage detection. His innovative approach has led to the development of a patented method that enhances the accuracy and efficiency of leakage measurements.

Latest Patents

Atsushi Ohki holds a patent for a "Method and system for measuring external leakage." This invention represents a crucial advancement in the field, providing a reliable solution for detecting leaks in various applications. The patent showcases his expertise and commitment to innovation.

Career Highlights

Ohki is currently employed at Osaka Sanso Kogyo Ltd., where he continues to work on cutting-edge technologies. His role at the company allows him to apply his inventive skills to real-world challenges, contributing to the advancement of measurement systems.

Collaborations

Throughout his career, Atsushi Ohki has collaborated with talented individuals such as Tadihiro Ohmi and Yohichi Kanno. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

Atsushi Ohki's contributions to leakage measurement technology exemplify the impact of dedicated inventors in advancing industry standards. His work not only enhances measurement accuracy but also reflects the spirit of innovation that drives progress in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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