Company Filing History:
Years Active: 2022-2025
Title: Innovations of Atsushi Ogata
Introduction
Atsushi Ogata is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing and plasma processing technologies. With a total of 3 patents to his name, Ogata continues to push the boundaries of innovation in his industry.
Latest Patents
One of his latest patents is a substrate processing apparatus. This apparatus comprises a substrate support disposed in the chamber, a shutter including a valve body configured to open and close an opening of the chamber, and a baffle plate disposed between an inner peripheral side of the chamber and the substrate support. The baffle plate has a vertically inclined portion at an end portion on the substrate support side, along with a contact member formed of a conductive elastic material. In a state where the shutter is closed, contact between the end portion on the substrate support side and the contact member is maintained.
Another notable patent is for a plasma processing apparatus. In this apparatus, a table has a wafer support to hold a wafer and a peripheral segment surrounding the wafer support, which features through-holes. The peripheral segment has an upper surface lower than that of the wafer support. An outer focus ring is disposed over the peripheral segment and has a recess or a cutout at its inner portion, which also contains through-holes. An inner focus ring is placed in the recess or cutout of the outer focus ring, while lift pins extend through the through-holes of both the peripheral segment and the outer focus ring. Shift mechanisms control the movement of the respective lift pins.
Career Highlights
Atsushi Ogata is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of substrate processing and plasma processing.
Collaborations
Ogata has collaborated with notable colleagues such as Shuichi Takahashi and Takaharu Miyadate. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.
Conclusion
Atsushi Ogata's contributions to the field of substrate and plasma processing technologies highlight his role as a key innovator. His patents reflect a commitment to advancing technology and improving manufacturing processes.