Kanagawa, Japan

Atsushi Kohno

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Kohno. Retrieved from https://idiyas.com/inventor/atsushi-kohno-1jh9v2f2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 234(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Atsushi Kohno: Innovator in Thin Film Semiconductor Technology

Introduction

Atsushi Kohno is a prominent inventor based in Kanagawa, Japan. He is known for his significant contributions to the field of semiconductor technology, particularly in the fabrication of thin film semiconductor devices. His innovative methods have paved the way for advancements in high-performance electronics.

Latest Patents

Atsushi Kohno holds a patent for a "Method and apparatus for fabricating a thin film semiconductor device." This patent describes a process where an amorphous silicon (a-Si:H) thin film is produced on a wafer and subsequently melting-recrystallized using a laser beam in a laser annealing chamber. This process results in the creation of a polycrystalline silicon (poly-Si) thin film. The wafer is then transported to a chemical vapor deposition (CVD) chamber without exposure to outside air, where a gate insulating film is formed on the clean surface of the polycrystalline silicon thin film. In another scenario, the a-Si:H thin film undergoes melting-recrystallization in the laser annealing chamber, followed by transport to a hydrogenating chamber for plasma hydrogenation. This method ensures the fabrication of thin film semiconductor devices with high performance, reliability, and uniformity.

Career Highlights

Atsushi Kohno is currently associated with Sony Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in enhancing the quality and performance of electronic devices, contributing to the company's reputation as a leader in the industry.

Collaborations

Atsushi Kohno has collaborated with notable colleagues, including Masaki Hara and Naoki Sano. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Atsushi Kohno's contributions to the field of thin film semiconductor devices exemplify the impact of innovative thinking in technology. His patented methods not only enhance device performance but also ensure high reliability and uniformity in production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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