Miyagi, Japan

Atsushi Kawabata

USPTO Granted Patents = 4 

Average Co-Inventor Count = 1.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Nirasaki, JP (2008 - 2009)
  • Miyagi, JP (2016 - 2022)

Company Filing History:


Years Active: 2008-2022

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Atsushi Kawabata

Introduction

Atsushi Kawabata is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of electrostatic chuck technology, holding a total of 4 patents. His work focuses on enhancing the efficiency and functionality of plasma processing apparatuses.

Latest Patents

Kawabata's latest patents include a structure for the automatic in-situ replacement of a part of an electrostatic chuck. This innovative substrate support is designed for use in a reaction chamber and features a base along with an in-situ electrostatic chuck. The chuck consists of a first electrode that holds a wafer to its upper surface through an electrostatic attractive force when a specific voltage is applied. Additionally, a second electrode opposes the upper surface of the base, allowing the chuck to be held in place by another electrostatic attractive force. Notably, when the second voltage is not supplied, the chuck can be replaced in-situ without removing the base or exposing the reaction chamber to the external atmosphere.

Another significant patent by Kawabata is a de-chuck control method and control device for plasma processing apparatuses. This method involves measuring the current flowing from the chuck electrode after a plasma process and calculating a counter voltage based on the residual charge of the electrostatic chuck. This innovative approach enhances the efficiency of the de-chucking process, ensuring better control during plasma operations.

Career Highlights

Atsushi Kawabata is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to further develop his innovative ideas and contribute to advancements in technology.

Collaborations

Kawabata has collaborated with talented coworkers such as Shinya Morikita and Daisuke Hayashi. Their combined expertise has fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Atsushi Kawabata's contributions to the field of electrostatic chuck technology are noteworthy. His innovative patents and collaborative efforts at Tokyo Electron Limited highlight his commitment to advancing technology in the semiconductor industry.

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