Wako, Japan

Atsushi Kakosaka

This inventor holds 1 USPTO granted patent. Top assignees: Honda Motor Co., Ltd., Seiren Company, Ltd. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Kakosaka. Retrieved from https://idiyas.com/inventor/atsushi-kakosaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Atsushi Kakosaka: Innovator in Stretchable Artificial Leather

Introduction

Atsushi Kakosaka is a notable inventor based in Wako, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative artificial leather.

Latest Patents

Kakosaka holds a patent for a stretchable artificial leather. This invention comprises a fibrous substrate made from tricot knitted fabric, with a polyurethane resin layer laminated on its surface. The stretchable artificial leather features a fixed load elongation of 30 to 60% in the longitudinal, lateral, and bias directions. This unique property enhances its usability in various applications.

Career Highlights

Throughout his career, Atsushi Kakosaka has worked with prominent companies, including Honda Motor Co., Ltd. and Seiren Company, Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects.

Collaborations

Kakosaka has collaborated with talented individuals such as Tomoyuki Uemura and Yukito Kaneko. These partnerships have fostered a creative environment that has led to advancements in material technology.

Conclusion

Atsushi Kakosaka's work in stretchable artificial leather exemplifies his innovative spirit and dedication to advancing material science. His contributions continue to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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