Wakayama, Japan

Atsushi Ishikawa

This inventor holds 7 USPTO granted patents. Top assignee: Kao Corporation. Active years: 1990-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Ishikawa. Retrieved from https://idiyas.com/inventor/atsushi-ishikawa-pi6g33ag

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 85.7

Average Co-Inventor Count = 3.2

ph-index = 3

Forward Citations = 56(Granted Patents)


Location History:

  • Hagagun, JP (1992)
  • Tochigi-ken, JP (1996)
  • Wakayama, JP (1990 - 2004)

Company Filing History:


Years Active: 1990-2004

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7 patents (USPTO):Explore Patents

Title: The Innovations of Atsushi Ishikawa

Introduction

Atsushi Ishikawa is a notable inventor based in Wakayama, Japan. He has made significant contributions to the field of polyurethane production, holding a total of 7 patents. His work has been instrumental in advancing the technology and applications of polyurethane materials.

Latest Patents

Ishikawa's latest patents include innovative processes for producing polyurethane and polyurethane foam. These patents reflect his commitment to enhancing the efficiency and effectiveness of polyurethane manufacturing.

Career Highlights

Atsushi Ishikawa is currently employed at Kao Corporation, a leading company in the consumer goods and chemical industry. His role at Kao Corporation allows him to apply his expertise in developing new materials and processes that benefit various applications.

Collaborations

Throughout his career, Ishikawa has collaborated with talented individuals such as Masayoshi Morii and Mitsuru Sakai. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Atsushi Ishikawa's contributions to the field of polyurethane production demonstrate his dedication to innovation and excellence. His patents and collaborations highlight the importance of teamwork in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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