Osaka, Japan

Atsushi Irie

This inventor holds 1 USPTO granted patent. Top assignees: Fujitec Co., Ltd., Toyo Shutter Co., Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Irie. Retrieved from https://idiyas.com/inventor/atsushi-irie-95o05vql

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Atsushi Irie: Innovator in Elevator Technology

Introduction

Atsushi Irie is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of elevator technology, particularly with his innovative designs aimed at enhancing safety and functionality.

Latest Patents

Atsushi Irie holds a patent for a door device of an elevator. This invention involves an entrance frame that connects a landing hall to a hoistway. The design includes landing doors equipped with smoke shielding members that prevent smoke infiltration during emergencies. These members are strategically placed on the top, sides, and bottom of the landing doors to ensure maximum protection.

Career Highlights

Throughout his career, Atsushi has worked with reputable companies such as Toyo Shutter Co., Ltd. and Fujitec Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in elevator safety technology.

Collaborations

Atsushi has collaborated with talented individuals in his field, including Mitsuru Morotome and Hiroyuki Yoshida. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Atsushi Irie is a distinguished inventor whose work in elevator technology has made a lasting impact on safety standards. His innovative designs continue to influence the industry and enhance user safety in elevators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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