Location History:
- Tokyo, JP (1997)
- Yamanashi-ken, JP (1997)
Company Filing History:
2 out of 10,341 
1 out of 21,351 
Years Active: 1997
Title: Atsushi Hosaka: Innovator in Doped Film Technology
Introduction
Atsushi Hosaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of film formation technology, particularly through his innovative methods for creating doped films. With a total of 2 patents, his work has garnered attention in various technological circles.
Latest Patents
One of Hosaka's latest patents is a method of forming a doped film. This method involves several steps, including preparing a gas source for supplying a film-forming gas and doping gases into a process tube. The process also includes using a dry pump to exhaust the process tube and an apparatus for burning unreacted elements in waste gas. The method ensures that a plurality of substrates are arranged in the process tube with specific intervals, maintaining reduced pressure while heating the substrates to a temperature range of 500°C to 600°C. The control of the amounts of doping and film-forming gases is crucial, with a specific ratio maintained during the process.
Career Highlights
Atsushi Hosaka has worked with notable companies such as Tokyo Electron Limited and Mitsubishi Electric Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Throughout his career, Hosaka has collaborated with esteemed colleagues, including Toshiharu Nishimura and Mitsuaki Iwashita. These collaborations have further enriched his work and expanded the impact of his inventions.
Conclusion
Atsushi Hosaka is a notable inventor whose work in doped film technology has led to significant advancements in the field. His innovative methods and collaborations with industry leaders highlight his contributions to technology and innovation.