Company Filing History:
Years Active: 2011
Title: Atsushi Hayashida: Innovator in Semiconductor Polishing Technologies
Introduction
Atsushi Hayashida is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing techniques for advanced materials.
Latest Patents
Hayashida holds a patent for "Periodic acid compositions for polishing ruthenium/low K substrates." This innovative method involves polishing a semiconductor substrate surface that features ruthenium and dielectric materials. The process utilizes an aqueous composition containing periodic acid and silica abrasive, achieving a remarkable removal selectivity of ruthenium to low-K dielectric greater than 20:1. This method allows for a one-step polishing process, enhancing efficiency in semiconductor manufacturing.
Career Highlights
Atsushi Hayashida is currently employed at DuPont Air Products Nanomaterials, LLC. His work focuses on developing advanced materials and processes that improve the performance and reliability of semiconductor devices. His expertise in polishing techniques has positioned him as a key figure in the industry.
Collaborations
Hayashida has collaborated with notable colleagues, including Robert J. Small and Haruki Nojo. These partnerships have fostered innovation and contributed to the advancement of semiconductor technologies.
Conclusion
Atsushi Hayashida's contributions to semiconductor polishing technologies exemplify his commitment to innovation in the field. His patented methods and collaborative efforts continue to influence the industry positively.