This inventor holds 5 USPTO granted patents. Top assignee: Tosoh Corporation. Active years: 1999-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yamaguchi, JP (1999)
- Shinnanyo, JP (2000 - 2003)
Company Filing History:
Years Active: 1999-2003
Title: **Atsushi Harada: Innovator in Gas Separation Technologies**
Introduction
Atsushi Harada, an accomplished inventor based in Shinnanyo, Japan, has made significant contributions to the field of gas separation technologies. With a total of five patents to his name, Harada's work focuses primarily on methods for purifying and separating gases, which are vital in various industrial applications.
Latest Patents
Harada's latest innovations include two notable patents that showcase his expertise in gas separation. The first patent details a **Method of Adsorptive Separation of Carbon Dioxide**. This process involves adsorbing carbon dioxide from gaseous mixtures containing less polar gases. The technique utilizes a zeolite adsorbent, specifically a low-silica type X zeolite with an SiO/AlO molar ratio of 1.9 to 2.1, ensuring effective separation when the carbon dioxide's partial pressure is maintained between 0.1 to 50 mmHg. The zeolite adsorbent is ideally ion-exchanged with lithium and/or sodium, and its preparation includes a caustic solution treatment of calcined low-silica type X zeolite mixed with kaolin clay.
The second patent addresses a **Method for Purifying Hydrogen-Based Gas Mixture**. This invention focuses on removing impurities such as carbon monoxide, nitrogen, and methane from hydrogen-based gas mixtures. Similar to the first patent, this method employs a zeolite adsorbent consisting largely of low-silica type X zeolite with the same molar ratio specifications. The effectiveness of this purifying process is enhanced through ion-exchange with lithium and/or calcium.
Career Highlights
Throughout his career, Atsushi Harada has played a pivotal role in advancing gas separation technologies. Currently, he is affiliated with Tosoh Corporation, a leading organization known for its commitment to innovation in chemical manufacturing. Harada's dedication to research and development has enabled his patents to contribute significantly to enhancing industrial gas purification processes.
Collaborations
In his inventive journey, Harada has collaborated with esteemed colleagues such as Shigeru Hirano and Hajime Funakoshi. Together, they have leveraged their combined expertise to push the boundaries of research and development in gas separation methods, making strides in efficiency and efficacy.
Conclusion
Atsushi Harada stands as a prominent figure in the realm of gas separation technology. His innovative patents and collaborative efforts with fellow researchers mark him as an influential inventor, contributing to advancements that have broad implications for industrial practices. As Harada continues to explore new frontiers in his field, his work remains critical to addressing global challenges related to gas purification and separation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
