Company Filing History:
Years Active: 2023
Title: Innovations of Atsushi Gorai in Sputtering Technology
Introduction
Atsushi Gorai is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent. His work focuses on improving the quality and efficiency of sputtering targets used in various applications.
Latest Patents
Atsushi Gorai holds a patent for a sputtering target and its production method. The primary objective of this invention is to provide a sputtering target that minimizes the generation of fine nodules, which can lead to an increase in substrate particles during the sputtering process. The patent describes a ceramic sputtering target with a surface roughness Ra of 0.5 μm or less and an Svk value measured with a laser microscope on the sputtering surface of 1.1 μm or less. This innovation is crucial for enhancing the performance of sputtering processes in various industries.
Career Highlights
Atsushi Gorai is associated with JX Nippon Mining & Metals Corporation, where he applies his expertise in materials science and engineering. His work at the company has been instrumental in advancing sputtering technologies and improving product quality.
Collaborations
Atsushi collaborates with talented colleagues such as Tomoji Mizuguchi and Hidetoshi Sasaoka. Their combined efforts contribute to the ongoing development of innovative solutions in the field of sputtering technology.
Conclusion
Atsushi Gorai's contributions to sputtering technology through his patent demonstrate his commitment to innovation and excellence. His work not only enhances the efficiency of sputtering processes but also sets a benchmark for future advancements in the industry.