The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
Jan. 14, 2020
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventors:
Tomoji Mizuguchi, Ibaraki, JP;
Hidetoshi Sasaoka, Ibaraki, JP;
Haruhi Nakamura, Ibaraki, JP;
Atsushi Gorai, Ibaraki, JP;
Assignee:
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/08 (2006.01); C04B 35/457 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C04B 35/457 (2013.01); C23C 14/086 (2013.01); C04B 2235/3293 (2013.01); C04B 2235/77 (2013.01);
Abstract
An object of the present invention is to provide a sputtering target that can suppress a generation amount of fine nodules which lead to an increase in substrate particles during sputtering, and a method for producing the same. A ceramic sputtering target, the sputtering target having a surface roughness Ra on a sputtering surface of 0.5 μm or less and an Svk value measured with a laser microscope on the sputtering surface of 1.1 μm or less.