Ebina, Japan

Atsushi Fukugawa


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Kanagawa, JP (2010)
  • Ebina, JP (2001 - 2021)

Company Filing History:


Years Active: 2001-2021

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3 patents (USPTO):Explore Patents

Title: Innovations by Atsushi Fukugawa

Introduction

Atsushi Fukugawa is a notable inventor based in Ebina, Japan. He has made significant contributions to the field of semiconductor technology and liquid droplet ejection systems. With a total of 3 patents to his name, Fukugawa's work showcases his expertise and innovative spirit.

Latest Patents

Fukugawa's latest patents include a method for manufacturing semiconductor substrates. This method involves preparing a semiconductor substrate with an epitaxial layer and forming a fracture layer on its rear surface before creating elements on the epitaxial layer. Another significant patent is for a liquid droplet ejecting head, which features a pressure chamber connected to a nozzle for ejecting liquid droplets. This invention includes a vibrating plate, a lower electrode, and a piezoelectric body designed for optimal performance in liquid ejection.

Career Highlights

Throughout his career, Atsushi Fukugawa has worked with prominent companies such as Fuji Xerox Co., Ltd. and Fujifilm Business Innovation Corp. His experience in these organizations has allowed him to develop and refine his innovative ideas in technology.

Collaborations

Fukugawa has collaborated with talented individuals in his field, including Michiaki Murata and Regan Nayve. These partnerships have contributed to the advancement of his projects and inventions.

Conclusion

Atsushi Fukugawa's contributions to semiconductor technology and liquid droplet ejection systems highlight his innovative capabilities. His patents reflect a commitment to advancing technology and improving manufacturing processes.

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