The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2001
Filed:
Nov. 27, 1998
Michiaki Murata, Ebina, JP;
Regan Nayve, Ebina, JP;
Atsushi Fukugawa, Ebina, JP;
Masahiko Fujii, Ebina, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
Through-holes serving as common liquid chambers,are formed in a flow channel substrate,by a wet anisotropic etching process. One opened end of each through-hole serves as a liquid inlet,Trenches rectangular in cross section, which are used as liquid flow channels,are formed in the flow channel substrate by RIE process. Each liquid flow channel,includes a front constriction,formed near its associated discharge orifice,and a rear constriction,formed near a connection portion between the channel and the common liquid chamber,The common liquid chamber,is communicatively connected to the liquid flow channel,in a linear fashion, and a portion of the liquid flow channel,between the front constriction,and the rear constriction,may be designed to be broad. Therefore, the flow channel resistance is reduced, the liquid jetting efficiency is improved, and the liquid re-supplying is performed at high speed.