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Title: Innovations of Atsushi Amatatsu
Introduction
Atsushi Amatatsu is a notable inventor based in Naka, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of plasma processing devices.
Latest Patents
One of his latest patents is a plasma processing apparatus with a real-time particle filter. This innovative device includes a plasma generation unit that utilizes a cathodic arc discharge to generate plasma. It features first and second magnetic field ducts arranged in a row, which transport the plasma to a processing chamber. The processing chamber is equipped with a stage for holding a substrate to be processed. A movable shutter is incorporated to cover the plasma during specific time intervals after the start or before the end of the arc discharge. This shutter is designed to be electrically insulated from the processing chamber.
Another significant patent by Amatatsu is also a plasma processing apparatus with a real-time particle filter. This invention addresses the need for efficiently capturing and removing electrically charged and neutral particles, particularly those with a diameter of up to 5 micrometers. The device employs an electric field filter with a cylindrical structure that has an uneven inner wall shape. A voltage ranging from 10 to 90 volts is applied to this filter, enhancing its ability to capture charged particles. Additionally, a neutral filter is utilized to effectively capture neutral particles.
Career Highlights
Throughout his career, Atsushi Amatatsu has worked with prominent companies, including Hitachi, Ltd. His experience in the industry has allowed him to develop innovative solutions in plasma processing technology.
Collaborations
Amatatsu has collaborated with notable individuals such as Hiroshi Inaba and Shinji Sasaki. These partnerships have contributed to the advancement of his inventions and the development of new technologies.
Conclusion
Atsushi Amatatsu's contributions to plasma processing technology through his patents demonstrate his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future developments.