Kanagawa, Japan

Atsuro Nomoto

This inventor holds 1 USPTO granted patent. Top assignee: Fujifilm Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsuro Nomoto. Retrieved from https://idiyas.com/inventor/atsuro-nomoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Atsuro Nomoto and Polarizer Materials Innovation.

Introduction

Atsuro Nomoto is an inventor associated with Fujifilm Corporation in Kanagawa, Japan. His patent work concerns materials and structures for polarizers used in image display devices. The supplied information lists 1 patent.

Latest Patents

Nomoto is named on the patent “Composition for Forming Polarizer, Polarizer, Laminate, and Image Display Device.” The invention describes a composition containing a polymerizable liquid crystal compound, a monofunctional polymerizable compound, and a dichroic material. It specifies that the ratio between the compounds’ atom counts must satisfy 0.35 ≤ NB/NA ≤ 0.65. The composition is intended to enable the formation of a polarizer with an excellent surface state, as well as related laminates and image display devices.

Career Highlights

The available information identifies Nomoto’s work with Fujifilm Corporation and highlights his contribution to polarizer materials. The patent focuses on the composition’s molecular components and their proportions as a means of supporting polarizer surface quality.

Collaborations

Wataru Hoshino is listed as Nomoto’s coworker. The supplied information does not specify their roles or the nature of their collaboration on the patent.

Conclusion

Atsuro Nomoto’s listed patent reflects work on liquid-crystal-based compositions for polarizers, with an emphasis on achieving an excellent surface state for display-related applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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