Nonoichi Ishikawa, Japan

Atsuro Inada

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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4 patents (USPTO):

Title: Innovations of Atsuro Inada

Introduction

Atsuro Inada is a notable inventor based in Nonoichi, Ishikawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on the development of advanced semiconductor devices and manufacturing methods.

Latest Patents

Inada's latest patents include innovative designs for semiconductor devices. One of his patents describes a semiconductor device that comprises a semiconductor part, first to third electrodes, and a control electrode. The first electrode is positioned on the back surface of the semiconductor part, while the second electrode is located on the front surface. The third electrode and the control electrode are integrated within a trench of the semiconductor part. The control electrode features first and second control portions, and the device includes multiple insulating films to enhance its functionality. Another patent outlines a semiconductor device that includes a semiconductor part, a first electrode, a control electrode, and second electrodes, all strategically placed within trenches to optimize performance.

Career Highlights

Atsuro Inada has worked with prominent companies in the technology sector, including Kabushiki Kaisha Toshiba and Toshiba Electronic Devices & Storage Corporation. His experience in these organizations has allowed him to develop and refine his expertise in semiconductor technology.

Collaborations

Inada has collaborated with notable colleagues such as Hiroaki Katou and Tatsuya Shiraishi. Their joint efforts have contributed to advancements in semiconductor device technology.

Conclusion

Atsuro Inada's innovative work in semiconductor technology has led to the development of several important patents. His contributions continue to influence the field and demonstrate the importance of collaboration in driving technological advancements.

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