Yachimata, Japan

Atsunobu Ohkuba

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsunobu Ohkuba. Retrieved from https://idiyas.com/inventor/atsunobu-ohkuba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 350(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Atsunobu Ohkuba: Innovator in Vapor Deposition Technology

Introduction

Atsunobu Ohkuba is a notable inventor based in Yachimata, Japan. He has made significant contributions to the field of chemical vapor deposition technology. His innovative work has led to the development of a unique patent that enhances the efficiency of vapor deposition processes.

Latest Patents

Atsunobu Ohkuba holds a patent for a "Susceptor for vapor deposition." This novel susceptor is made from a ceramic material, specifically aluminum nitride, which is designed to improve the performance of chemical vapor deposition devices. His invention represents a significant advancement in the technology used for material deposition.

Career Highlights

Ohkuba is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role at the company allows him to work on cutting-edge technologies that drive innovation in manufacturing processes. His expertise in vapor deposition has positioned him as a key player in the field.

Collaborations

Throughout his career, Atsunobu Ohkuba has collaborated with esteemed colleagues, including Michio Aruga and Akihiko Saito. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Atsunobu Ohkuba's contributions to vapor deposition technology through his innovative patent and work at Applied Materials, Inc. highlight his importance in the field. His dedication to advancing technology continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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